TELIC

Chrome Photomask Blanks/Standard

Substrates:

Applications:

- SODA LIME
- BOROSILICATE (1737, D263, BOROFLOAT)
- WHITE CROWN (B-270, BK-7)
- QUARTZ ( SYNTHETIC FUSED SILICA)

- RETICLES, MASTER GRADE
- PRINT & TEST GRADE

Substrate Specification

SIZE:

Squares: 2" through 7"

THICKNESS:

0.020'' - 0.220'' (0.5mm - 6mm) (non standard thickness upon request)

SURFACE:

All plates polished on both sides & inspected
to be free of glass defects > 2&microm

FLATNESS:

Master Grade: < 5 m
Print Grade: &lt15 m

Film Specification

<12% @ 400nm> <33% @400nm> <55% @400nm>

CHROME:

Vacuum Deposited, DC Sputtered in Class 100 Environment

THICKNESS/
OPTICAL DENSITY:

Standard: 1200ű 10% /O.D.=3.0&plusmn0.3 @ 430mm.
Custom Thicknesses up to 5 m

REFLECTIVITY:

CHROME

LOW

MID

HI

PROCESS:

Etchable in all conventional Wet Etch systems.
Plasma Grade recommended for Dry Etch systems

PHOTORESIST:

Shipley 1800 or AZ 1500 filtered to 0.2 micron at point of use. All widely used positive and negative optical and E-beam resist available


Telic Company
24832 Avenue Rockefeller
Valencia, CA 91355

Phone: 661.702.8603
Toll Free: (888) TELICCO
Fax: 661.257.6802
E-mail: telic2000@aol.com


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www.TelicCompany.com

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